Pure and Applied Chemistry, 1980, Volume 52, No. 7, pp. 1707-1720

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Pure Appl. Chem., 1980, Vol. 52, No. 7, pp. 1707-1720

doi:10.1351/pac198052071707

Thermal plasma technology for processing of refractory materials

C. Bonet

Full text - pdf 377 kB

All articles from the Fourth International Symposium on Plasma Chemistry, Zurich, Switzerland, 27 August–1 September 1979.