Pure Appl. Chem., 1980, Vol. 52, No. 7, pp. 1817-1827
doi:10.1351/pac198052071817
Plasma processing of oxide systems in the temperature range 1000-3000 K
C. B. Alcock
All articles from the Round Table on Thermal Plasma Processing, Zurich, Switzerland, 27 August–1 September 1979.