Pure Appl. Chem., 1984, Vol. 56, No. 2, pp. 215-230
doi:10.1351/pac198456020215
Basic phenomena in reactive low pressure plasmas used for deposition and etching-current status
G. Turban
All articles from the Sixth International Symposium on Plasma Chemistry, Montreal, Quebec, Canada, 24–28 July 1983.