Pure Appl. Chem., 1985, Vol. 57, No. 9, pp. 1311-1320
doi:10.1351/pac198557091311
On the plasmaphysics of plasma-etching
T. J. Bisschops and F. J. de Hoog
Adobe Acrobat Reader
Our PDF files are best viewed with Adobe Acrobat Reader 6 or higher.
