Pure Appl. Chem., 1988, Vol. 60, No. 7, pp. 959-972
doi:10.1351/pac198860070959
Solution photochemistry of poly(dialkylsilanes): a new class of photoresists
J. Michl, J. W. Downing, T. Karatsu, A. J. McKinley, G. Poggi, G. M. Wallraff, R. Sooriyakumaran and R. D. Miller
All articles from the Twelfth International Symposium on Photochemistry, Bologna, Italy, 17–22 July 1988.