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1996, Vol. 68, Issue 5

12th International Symposium on Plasma Chemistry, Minneapolis, USA, 21–26 August 1995

Advanced diagnostic techniques for thermal plasmas
J. R. Fincke
p. 1001 [Details] [Full text - pdf 492 kB]
New frontiers in thermal plasma processing
M. I. Boulos
p. 1007 [Details] [Full text - pdf 290 kB]
Future prospects for dry etching
K. Suzuki and N. Itabashi
p. 1011 [Details] [Full text - pdf 511 kB]
From molecules to particles in silane plasmas
A. A. Howling, C. Courteille, J.-L. Dorier, L. Sansonnens and Ch. Hollenstein
p. 1017 [Details] [Full text - pdf 615 kB]
Design of novel nanocrystalline composite materials by means of plasma CVD
S. Veprek
p. 1023 [Details] [Full text - pdf 414 kB]
Characterisation of plasmas by advanced diagnostic methods
K. Wiesemann
p. 1029 [Details] [Full text - pdf 553 kB]
High temperature treatment of waste: From laboratories to the industrial stage
R. Poiroux and M. Rollin
p. 1035 [Details] [Full text - pdf 673 kB]
Self-consistent analysis of low temperature oxygen plasma and processes of its interaction with some polymer materials
V. V. Rybkin, A. B. Bessarab, E. V. Kuvaldina, A. I. Maximov and V. A. Titov
p. 1041 [Details] [Full text - pdf 467 kB]
Plasmas and polymers: From laboratory to large scale commercialization
M. R. Wertheimer, H. R. Thomas, M. J. Perri, J. E. Klemberg-Sapieha and L. Martinu
p. 1047 [Details] [Full text - pdf 1016 kB]
Radio frequency inductive discharge source design for large area processing
A. E. Wendt and L. J. Mahoney
p. 1055 [Details] [Full text - pdf 387 kB]
Measurements of CFX and SiHX radicals in ECR and RF plasmas used for material processing
T. Goto
p. 1059 [Details] [Full text - pdf 323 kB]
Nonlocal behaviour of the electron component in nonequilibrium plasmas
R. Winkler, F. Sigeneger and D. Uhrlandt
p. 1065 [Details] [Full text - pdf 560 kB]
Surface chemistry during plasma etching of silicon
V. M. Donnelly, I. P. Herman, C. C. Cheng and K. V. Guinn
p. 1071 [Details] [Full text - pdf 333 kB]
Dissociation and atom recombination of H2 and D2 on metallic surfaces: A theoretical survey
M. Cacciatore and G. D. Billing
p. 1075 [Details] [Full text - pdf 602 kB]
Electron beam and pulsed corona processing of volatile organic compounds in gas streams
B. M. Penetrante, M. C. Hsiao, J. N. Bardsley, B. T. Merritt, G. E. Vogtlin, P. H. Wallman, A. Kuthi, C. P. Bukhart and J. R. Bayless
p. 1083 [Details] [Full text - pdf 443 kB]
Chemistry of the electron beam process and its application to emission control
H. Mätzing, W. Baumann and H.-R. Paur
p. 1089 [Details] [Full text - pdf 362 kB]
Coating generation: Vaporization of particles in plasma spraying and splat formation
M. Vardelle, A. Vardelle, K.-I. Li, P. Fauchais and N. J. Themelis
p. 1093 [Details] [Full text - pdf 719 kB]
Application of plasma spraying to solid oxide fuel cell production
A. Notomi and N. Hisatome
p. 1101 [Details] [Full text - pdf 544 kB]
Analysis of Coulomb-crystal formation process for application to tailored particle synthesis in RF plasmas
K. Tachibana and Y. Hayashi
p. 1107 [Details] [Full text - pdf 670 kB]
Induction plasma synthesis of ultrafine SiC
F. Gitzhofer
p. 1113 [Details] [Full text - pdf 840 kB]
Formation of dense submicronic clouds in low pressure Ar-SiH4 RF reactor: Diagnostics and growth processes from monomers to large size particulates
A. Bouchoule, L. Boufendi, J. Hermann, A. Plain, T. Hbid, G. Kroesen, E. Stoffels and W. W. Stoffels
p. 1121 [Details] [Full text - pdf 469 kB]
Kinetic models of plasma-particle charge, momentum and energy transfer under rarefied flow conditions
A. G. Gnedovets
p. 1127 [Details] [Full text - pdf 418 kB]
Influence of metal vapours on arc properties
S. Vacquie
p. 1133 [Details] [Full text - pdf 315 kB]
Modelling and diagnostics of plasma chemical processes in mixed-gas arcs
A. B. Murphy
p. 1137 [Details] [Full text - pdf 505 kB]
Plasma deposition of amorphous silicon alloys from fluorinated gases
G. Cicala, G. Bruno and P. Capezzuto
p. 1143 [Details] [Full text - pdf 619 kB]
Synthesis of carbon clusters and thin films by low temperature plasma chemical vapor deposition under atmospheric pressure
H. Koinuma, T. Horiuchi, K. Inomata, H.-K. Ha, K. Nakajima and K. A. Chaudhary
p. 1151 [Details] [Full text - pdf 359 kB]
Fast deposition of thin amorphous layers using an expanding thermal plasma
M. C. M. van de Sanden, J. W. A. M. Gielen, R. J. Severens, R. M. J. Paffen and D. C. Schram
p. 1155 [Details] [Full text - pdf 347 kB]
Plasma processing of dusts and residues
D. Neuschütz
p. 1159 [Details] [Full text - pdf 497 kB]

IUPAC Technical Reports and Recommendations

Pesticides report 36. Glossary of terms relating to pesticides (IUPAC Recommendations 1996)
P. T. Holland
p. 1167 [Details] [Full text - pdf 1840 kB]