Pure Appl. Chem., 1996, Vol. 68, No. 5, pp. 1071-1074
doi:10.1351/pac199668051071
Surface chemistry during plasma etching of silicon
V. M. Donnelly, I. P. Herman, C. C. Cheng and K. V. Guinn
All articles from the 12th International Symposium on Plasma Chemistry, Minneapolis, USA, 21–26 August 1995.