Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1151-1156
doi:10.1351/pac199870061151
Treatment of dust particles in an RF plasma monitored by Mie scattering rotating compensator ellipsometry*
G. H. P. M. Swinkels, E. Stoffels, W.W. Stoffels, N. Simons, G. M. W. Kroesen, and F.J. de Hoog
*13th International Symposium on Plasma Chemistry (ISPC-13), Beijing, China, 18-22 August 1997