Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1181-1186
doi:10.1351/pac199870061181
Plasmasurface interactions in the processing of iiiv semiconductor materials*
M. Losurdo, P. Capezzuto and G. Bruno
*13th International Symposium on Plasma Chemistry (ISPC-13), Beijing, China, 18-22 August 1997