Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1193-1197
doi:10.1351/pac199870061193
High rate deposition of thick epitaxial films by thermal plasma flash evaporation*
K. Terashima, N. Yamaguchi, T. Hattori, Y. Takamura and T. Yoshida
*13th International Symposium on Plasma Chemistry (ISPC-13), Beijing, China, 18-22 August 1997