Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1199-1202
doi:10.1351/pac199870061199
Synthesis of ceramic films on metallic substrates using magnetron-sputtering deposition synchro-enhanced by microwave ECR plasma source ion implantation under high vacuum conditions*
T. Ma, X. Deng, W. Lu and J. Zhang
*13th International Symposium on Plasma Chemistry (ISPC-13), Beijing, China, 18-22 August 1997
