Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1203-1208
doi:10.1351/pac199870061203
Process control of organosilicon plasmas for barrier film preparations*
R. Lamendola and R. d'Agostino
*13th International Symposium on Plasma Chemistry (ISPC-13), Beijing, China, 18-22 August 1997