Pure Appl. Chem., 2002, Vol. 74, No. 9, pp. 1519-1526
doi:10.1351/pac200274091519
Structural variations in nanocrystalline nickel films*
Pratibha L. Gai,**, Rahul Mitra, and Julia R. Weertman
1DuPont, Central Research, Experimental Station, Wilmington, DE 19880-0356, USA; 2University of Delaware, Department of Materials Science and Engineering, Newark, DE 19716, USA; 3Northwestern University, Department of Materials Science, Evanston, IL 60208, USA; 4Defence Metallurgical Research Laboratory, Hyderabad, India
Abstract:
Nanocrystalline nickel films of technological importance have been grown on various liquid nitrogen-cooled substrates by magnetron sputtering with and without a substrate bias. The atomic structural and chemical studies have unveiled variations in inter- and intragranular structures under the different process conditions. The origin and the development of the crystallization process with and without the substrate bias voltage have been inferred from the results.
**Corresponding author.
All articles from the 2nd IUPAC Workshop on Advanced Materials (WAM II), Bangalore, India, 13–16 February 2002.