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Pure Appl. Chem., 2008, Vol. 80, No. 9, pp. 1909-1918

http://dx.doi.org/10.1351/pac200880091909

Self-organized nanoarrays: Plasma-related controls

Kostya (Ken) Ostrikov1,2, Igor Levchenko1 and Shuyan Xu3

1 Plasma Nanoscience, School of Physics, The University of Sydney, Sydney, NSW 2006, Australia
2 CSIRO Materials Science and Engineering, West Lindfield, NSW 2070, Australia
3 Plasma Sources and Applications Center, NIE and Institute of Advanced Studies, Nanyang Technological University, 637616, Singapore

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  • Ostrikov Kostya (Ken), Mehdipour Hamid: Rapid, simultaneous activation of thin nanowire growth in low-temperature, low-pressure chemically active plasmas. J Mater Chem 2011, 21, 8183. <http://dx.doi.org/10.1039/c1jm10318k>
  • Ostrikov K., Mehdipour H.: Energy and matter-efficient size-selective growth of thin quantum wires in a plasma. Appl Phys Lett 2011, 98, 033104. <http://dx.doi.org/10.1063/1.3540645>
  • Ostrikov K.: Nanoscale control of energy and matter in plasma–surface interactions: Toward energy- and matter-efficient nanotech. Phys Plasmas 2011, 18, 057101. <http://dx.doi.org/10.1063/1.3560509>
  • Ostrikov Kostya (Ken), Cvelbar Uros, Murphy Anthony B: Plasma nanoscience: setting directions, tackling grand challenges. J Phys D Appl Phys 2011, 44, 174001. <http://dx.doi.org/10.1088/0022-3727/44/17/174001>
  • Ostrikov Kostya (Ken): Control of energy and matter at nanoscales: challenges and opportunities for plasma nanoscience in a sustainability age. J Phys D Appl Phys 2011, 44, 174003. <http://dx.doi.org/10.1088/0022-3727/44/17/174003>
  • Ligatchev Valeri: Relating plasma processing, surface morphology, and electronic properties of nanomaterials. J Phys D Appl Phys 2011, 44, 174013. <http://dx.doi.org/10.1088/0022-3727/44/17/174013>
  • Han Z J, Levchenko I, Kumar S, Yajadda M M A, Yick S, Seo D H, Martin P J, Peel S, Kuncic Z, Ostrikov K: Plasma nanofabrication and nanomaterials safety. J Phys D Appl Phys 2011, 44, 174019. <http://dx.doi.org/10.1088/0022-3727/44/17/174019>
  • Bogaerts Annemie, Eckert Maxie, Mao Ming, Neyts Erik: Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials. J Phys D Appl Phys 2011, 44, 174030. <http://dx.doi.org/10.1088/0022-3727/44/17/174030>
  • Xiao S Q, Xu S: Plasma-aided fabrication in Si-based photovoltaic applications: an overview. J Phys D Appl Phys 2011, 44, 174033. <http://dx.doi.org/10.1088/0022-3727/44/17/174033>
  • Mehdipour H, Ostrikov K, Rider A E, Furman S A: Minimizing the Gibbs–Thomson effect in the low-temperature plasma synthesis of thin Si nanowires. J Nanotechnol 2011, 22, 315707. <http://dx.doi.org/10.1088/0957-4484/22/31/315707>
  • Ostrikov Kostya: . IEEE Trans Plas Sci 2011, 39, 963. <http://dx.doi.org/10.1109/TPS.2010.2085020>
  • Seo D. H., Rider A. E., Das Arulsamy A., Levchenko I., Ostrikov K.: Increased size selectivity of Si quantum dots on SiC at low substrate temperatures: An ion-assisted self-organization approach. J Appl Phys 2010, 107, 024313. <http://dx.doi.org/10.1063/1.3284941>
  • Levchenko I, Huang S Y, Ostrikov K, Xu S: Silicon on silicon: self-organized nanotip arrays formed in reactive Ar+H2 plasmas. J of Inst Physics Nanotechnology 2010, 21, 025605. <http://dx.doi.org/10.1088/0957-4484/21/2/025605>
  • Baranov Oleg, Romanov Maxim: Process Intensification in Vacuum Arc Deposition Setups. Plasma Process Polym 2009, 6, 95. <http://dx.doi.org/10.1002/ppap.200800131>
  • Arulsamy Andrew Das, Ostrikov Kostya (Ken): Diffusivity of adatoms on plasma-exposed surfaces determined from the ionization energy approximation and ionic polarizability. Lett A 2009, 373, 2267. <http://dx.doi.org/10.1016/j.physleta.2009.04.057>
  • Rider A.E., Ostrikov K.: The path to stoichiometric composition of III–V binary quantum dots through plasma/ion-assisted self-assembly. Surf Sei 2009, 603, 359. <http://dx.doi.org/10.1016/j.susc.2008.11.030>
  • Wang B. B., Ostrikov K.: Tailoring carbon nanotips in the plasma-assisted chemical vapor deposition: Effect of the process parameters. J Appl Phys 2009, 105, 083303. <http://dx.doi.org/10.1063/1.3112025>
  • Xu S., Levchenko I., Huang S. Y., Ostrikov K.: Self-organized vertically aligned single-crystal silicon nanostructures with controlled shape and aspect ratio by reactive plasma etching. Appl Phys Lett 2009, 95, 111505. <http://dx.doi.org/10.1063/1.3232210>
  • Levchenko I., Ostrikov K.: Self-organized quantum dot arrays: Kinetic mapping of adatom capture. Appl Phys Lett 2009, 95, 243102. <http://dx.doi.org/10.1063/1.3273369>
  • Levchenko I, Ostrikov K, Xu S: Thermodynamical and plasma-driven kinetic growth of high-aspect-ratio nanostructures: effect of hydrogen termination. J Phys D Appl Phys 2009, 42, 125207. <http://dx.doi.org/10.1088/0022-3727/42/12/125207>
  • Tam Eugene, Ostrikov Kostya (Ken): Catalyst size effects on the growth of single-walled nanotubes in neutral and plasma systems. J of Inst Physics Nanotechnology 2009, 20, 375603. <http://dx.doi.org/10.1088/0957-4484/20/37/375603>
  • Mariotti Davide, Bose Arumugam Chandra, Ostrikov Kostya (Ken): . IEEE Trans Plasma Sci 2009, 37, 1027. <http://dx.doi.org/10.1109/TPS.2009.2014067>
  • Tam Eugene, Ostrikov Kostya (Ken): Plasma-controlled adatom delivery and (re)distribution: Enabling uninterrupted, low-temperature growth of ultralong vertically aligned single walled carbon nanotubes. Appl Phys Lett 2008, 93, 261504. <http://dx.doi.org/10.1063/1.3058766>