Pure and Applied Chemistry

Author detail

Articles by K. Tachibana

• K. Tachibana and Y. Hayashi

  Analysis of Coulomb-crystal formation process for application to tailored particle synthesis in RF plasmas

  Vol. 68, Issue 5, p. 1107 [Details] [Full text - pdf 670 kB]
• K. Tachibana

  Diagnostics and control of low pressure plasmas for the chemical vapor deposition (CVD) of amorphous semiconductor and insulator films

  Vol. 60, Issue 5, p. 769 [Details] [Full text - pdf 1023 kB]