Pure and Applied Chemistry, Articles of R. d’Agostino

Author detail

A. Milella, F. Palumbo, P. Favia, G. Cicala and R. d’Agostino

Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges

2005, Vol. 77, Issue 2, pp. 399-414 [Details + Abstract] [Full text - pdf 968 kB]
R. Lamendola and R. d’Agostino

Process control of organosilicon plasmas for barrier film preparations

1998, Vol. 70, Issue 6, pp. 1203-1208 [Details] [Full text - pdf 478 kB]
P. Favia, R. d’Agostino and F. Fracassi

Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers

1994, Vol. 66, Issue 6, pp. 1373-1380 [Details] [Full text - pdf 534 kB]
R. d’Agostino, F. Fracassi and R. Lamendola

The chemistry of etching and deposition processes

1994, Vol. 66, Issue 6, pp. 1185-1193 [Details] [Full text - pdf 591 kB]
F. Fracassi and R. d’Agostino

Chemistry of titanium dry etching in fluorinated and chlorinated gases

1992, Vol. 64, Issue 5, pp. 703-707 [Details] [Full text - pdf 400 kB]
R. d’Agostino, P. Capezzuto, G. Bruno and F. Cramarossa

Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges

1985, Vol. 57, Issue 9, pp. 1287-1298 [Details] [Full text - pdf 210 kB]