13th International Symposium on Plasma Chemistry (ISPC-13), Beijing, China, 18–22 August 1997
This conference is part of the Plasma Chemistry series.
Plasma diagnosis by high-resolution spectroscopy of transient molecules
Treatment of dust particles in an RF plasma monitored by Mie scattering
rotating compensator ellipsometry
Water-stabilized plasma generators
Fluid dynamic modelling of electric arcs for industrial applications
Dielectric barrier discharges and ozone synthesis
Cold cathode arc attachment: The importance of the high local pressure
Plasmasurface interactions in the processing of iiiv semiconductor
materials
Phasespace modelling of a radiofrequency plasma interacting with surfaces
High rate deposition of thick epitaxial films by thermal plasma flash
evaporation
Synthesis of ceramic films on metallic substrates using magnetron-sputtering
deposition synchro-enhanced by microwave ECR plasma source ion implantation
under high vacuum conditions
Process control of organosilicon plasmas for barrier film preparations
Modeling droplet impact in plasma spray processes
Eulerain and Lagrangian modelling of dust-laden plasma jets
Thermal plasma process development in Norway