12th International Symposium on Plasma Chemistry, Minneapolis, USA, 21–26 August 1995
This conference is part of the Plasma Chemistry series.
Advanced diagnostic techniques for thermal plasmas
New frontiers in thermal plasma processing
Future prospects for dry etching
From molecules to particles in silane plasmas
Design of novel nanocrystalline composite materials by means of plasma CVD
Characterisation of plasmas by advanced diagnostic methods
High temperature treatment of waste: From laboratories to the industrial stage
Self-consistent analysis of low temperature oxygen plasma and processes of its interaction with some polymer materials
Plasmas and polymers: From laboratory to large scale commercialization
Radio frequency inductive discharge source design for large area processing
Measurements of CFX and SiHX radicals in ECR and RF plasmas used for material processing
Nonlocal behaviour of the electron component in nonequilibrium plasmas
Surface chemistry during plasma etching of silicon
Dissociation and atom recombination of H2 and D2 on metallic surfaces: A theoretical survey
Electron beam and pulsed corona processing of volatile organic compounds in gas streams
Chemistry of the electron beam process and its application to emission control
Coating generation: Vaporization of particles in plasma spraying and splat formation
Application of plasma spraying to solid oxide fuel cell production
Analysis of Coulomb-crystal formation process for application to tailored particle synthesis in RF plasmas
Induction plasma synthesis of ultrafine SiC
Formation of dense submicronic clouds in low pressure Ar-SiH4 RF reactor: Diagnostics and growth processes from monomers to large size particulates
Kinetic models of plasma-particle charge, momentum and energy transfer under rarefied flow conditions
Influence of metal vapours on arc properties
Modelling and diagnostics of plasma chemical processes in mixed-gas arcs
Plasma deposition of amorphous silicon alloys from fluorinated gases
Synthesis of carbon clusters and thin films by low temperature plasma chemical vapor deposition under atmospheric pressure
Fast deposition of thin amorphous layers using an expanding thermal plasma
Plasma processing of dusts and residues