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Pure Appl. Chem., 1992, Vol. 64, No. 5, pp. 725-730

http://dx.doi.org/10.1351/pac199264050725

Novel approaches to plasma deposition of amorphous silicon-based materials

G. Bruno, P. Capezzuto and G. Cicala

Individual author index pages

Other PAC articles by these authors

A. Milella, F. Palumbo, P. Favia, G. Cicala and R. d’Agostino
Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges
2005, Vol. 77, Issue 2, pp. 399-414 [Details + Abstract] [Full text - pdf 968 kB]
M. Losurdo, P. Capezzuto and G. Bruno
Plasmasurface interactions in the processing of iiiv semiconductor materials
1998, Vol. 70, Issue 6, pp. 1181-1186 [Details] [Full text - pdf 553 kB]
G. Cicala, G. Bruno and P. Capezzuto
Plasma deposition of amorphous silicon alloys from fluorinated gases
1996, Vol. 68, Issue 5, pp. 1143-1149 [Details] [Full text - pdf 619 kB]
P. Capezzuto and G. Bruno
Plasma deposition of amorphous silicon films: an overview on some open questions
1988, Vol. 60, Issue 5, pp. 633-644 [Details] [Full text - pdf 783 kB]
R. d’Agostino, P. Capezzuto, G. Bruno and F. Cramarossa
Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges
1985, Vol. 57, Issue 9, pp. 1287-1298 [Details] [Full text - pdf 210 kB]