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Pure Appl. Chem., 2002, Vol. 74, No. 3, pp. 401-405

http://dx.doi.org/10.1351/pac200274030401

Role of ions in SiO2 deposition with pulsed and continuous helicon plasmas

Christine Charles

Plasma Research Laboratory, Research School of Physical Sciences and Engineering, The Australian National University, Canberra, ACT 0200, Australia

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Other PAC articles by these authors

A.-L. Thomann, J. P. Rozenbaum, P. Brault, C. Andreazza, P. Andreazza, B. Rousseau, H. Estrade-Szwarckopf, A. Berthet, J. C. Bertolini, F. J. Cadete Santos Aires, F. Monnet, C. Mirodatos, C. Charles and R. Boswell
Plasma synthesis of catalytic thin films
2002, Vol. 74, Issue 3, pp. 471-474 [Details + Abstract] [Full text - pdf 196 kB]