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Pure Appl. Chem., 2008, Vol. 80, No. 9, pp. 1939-1951

http://dx.doi.org/10.1351/pac200880091939

Use of a low-pressure plasma discharge for the decontamination and sterilization of medical devices

François Rossi, Ondrej Kylián, Hubert Rauscher, Douglas Gilliland and Lucel Sirghi

European Commission, Joint Research Centre, Institute for Health and Consumer Protection, Via E. Fermi 1, 21020 Ispra (VA), Italy

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  • Vesel Alenka, Kolar Metod, Recek Nina, Kutasi Kinga, Stana-Kleinschek Karin, Mozetic Miran: Etching of Blood Proteins in the Early and Late Flowing Afterglow of Oxygen Plasma. Plasma Process. Polym. 2014, 11, 12. <http://dx.doi.org/10.1002/ppap.201300067>
  • Vesel Alenka, Kolar Metod, Stana-Kleinschek Karin, Mozetic Miran: Etching rates of blood proteins, blood plasma and polymer in oxygen afterglow of microwave plasma. Surf. Interface Anal. 2014, n/a. <http://dx.doi.org/10.1002/sia.5394>
  • Ahmed Mukhtar H., Keyes Tia E., Byrne John A.: The photocatalytic inactivation effect of Ag–TiO2 on β-amyloid peptide (1–42). Journal of Photochemistry and Photobiology A: Chemistry 2013, 254, 1. <http://dx.doi.org/10.1016/j.jphotochem.2012.12.019>
  • Fumagalli Francesco, Hanuš Jan, Kylián Ondřej, Rossi François: In situ Quartz Crystal Microbalance Measurements of Thin Protein Film Plasma Removal. Plasma Process Polym 2012, 9, 188. <http://dx.doi.org/10.1002/ppap.201100098>
  • De Geyter N., Morent R.: Nonthermal Plasma Sterilization of Living and Nonliving Surfaces. Annu. Rev. Biomed. Eng. 2012, 14, 255. <http://dx.doi.org/10.1146/annurev-bioeng-071811-150110>
  • Matsutani Akihiro, Takada Ayako: Microfabrication of Si and GaAs by Plasma Etching Process Using Bacterial Cells as an Etching Mask Material. Jpn. J. Appl. Phys. 2012, 51, 087001. <http://dx.doi.org/10.7567/JJAP.51.087001>
  • Clément F, Lecoq E, Duday D, Belmonte T, Audinot J-N, Lentzen E, Penny C, Cauchie H-M, Choquet P: NanoSIMS50 analyses of Ar/18O2 plasma-treated Escherichia coli bacteria. New J of Phys 2011, 13, 113040. <http://dx.doi.org/10.1088/1367-2630/13/11/113040>
  • Kylián Ondřej, Benedikt Jan, von Keudell Achim, Rossi François, Rauscher Hubert: Elimination of Biological Contaminations from Surfaces by Plasma Discharges: Chemical Sputtering. Chem Eur J of Chem Phys 2010, 11, 1382. <http://dx.doi.org/10.1002/cphc.200900757>
  • Kylián O, Rossi F: Sterilization and decontamination of medical instruments by low-pressure plasma discharges: application of Ar/O2/N2 ternary mixture. J Phys D Appl Phys 2009, 42, 085207. <http://dx.doi.org/10.1088/0022-3727/42/8/085207>
  • Rossi F, Kylián O, Rauscher H, Hasiwa M, Gilliland D: Low pressure plasma discharges for the sterilization and decontamination of surfaces. New J Phys 2009, 11, 115017. <http://dx.doi.org/10.1088/1367-2630/11/11/115017>